Wafer Calibration Standards; Cleanroom Foggers; Smoke Studies and Airflow Visualization; Silica & Polystyrene Micro-spheres as Particle Size Standards
Calibration Wafer Standards are produced using Polystyrene micro-spheres from 30 nm up to 15 µm deposited on the surface of 300mm, 200mm, 150mm, 100mm and 75mm silicon wafers, customer quartz masks and customer film deposited wafers. The Particle Size Standards deposited on these substrates are used to calibrate the size accuracy and response of your Tencor, KLA, KLA-Tencor, Hitachi, TopCon, Applied Materials, Tokyo Electron wafer inspection systems and SSIS scanning systems.
Contamination Wafer Standards are produced using NIST-Traceable Silica microspheres deposited on the substrates from 30 nm to 1.0 µm spherical particle diameter. Silica Contamination Wafer Standards are used to calibrate the size accuracy response of SSIS tools using high power UV, DUV light and blue laser wafer inspection systems. Our Clean Room Foggers are designed to support USP guidelines to visualize airflow turbulence, uniform airflow and dead spots in smoke studies of the clean rooms in Semiconductor and Pharmaceutical process labs.
Our polystyrene Particle Size Standards are highly accurate size standards available from 20 nm to 1000 µm. Our Silica microspheres from 30 nm to 1 µm are used in aerosol research and Pharmaceutical drug delivery; and silica micro-spheres are especially beneficial in Semiconductor CMP Slurry to provide the surface polish of 300 mm and 200 mm silicon wafers.
Contamination and Calibration Wafer Standards
Our Wafer Calibration Standards are used in Semiconductor Metrology Clean Rooms and designed to meet particle size calibration needs of Wafer Inspection Systems and SSIS tools using highly accurate, NIST Traceable, particle size standards with narrow size distributions.
Polystyrene Microspheres, NIST Traceable Sizing, Narrow Size Distributions
Our Polystyrene latex micro-sphere, particle size standards provide exceptional size accuracy and narrow size distribution for use and in Aerosol Particle Research, as well as in deposition of Calibration Wafer Standards.
Silica Microspheres for Metrology, CMP Slurry & Pharmaceutical Drug Delivery
NIST Traceable, Silica Microsphere, particle size standards are provided for size calibration of high power UV, DUV & blue laser wafer inspection systems. Silica particle size standards are also used in Drug Delivery and in CMP Slurries at 300 nm, 500 nm and 800 nm.
Clean Room Foggers for Smoke Studies, USP 797
Our ultrapure LN2 Foggers and Ultrasonic Cleanroom Foggers are used in Smoke Studies of Pharmaceutical process labs, ISO Suites and Semiconductor Clean Rooms to visualize air flow, turbulence, patterns, uniformity and to locate dead zones around equipment and under doorway entrances.
About Applied Metrology USA
Applied Metrology USA is at the forefront of Particle Deposition by providing Calibration Wafer Standards and Contamination Wafer Standards using Silica microsphere and Polystyrene particle size standards and beads. Our Silica and Polystyrene beads are used as Particle Size Standards around the world in aerosol research. Our Cleanroom foggers support USP 797 Guidelines for airflow visualization studies and FDA smoke studies of clean rooms, ISO suites and process labs around the world.
Our Wafer Calibration Standards support Semi Standards M52 guidelines for contamination control and size calibration of Scanning Surface Inspection Systems and SSIS tools by providing NIST Traceable, particle size accuracy in the size calibration of SSIS tools, such as KLA-Tencor SP1 TBI, SP2, SP2XP, SP5 unpatterned wafer inspection systems, as well as KLA patterned wafer defect inspection systems. We focus on product quality, product performance and particle size standards.
Our Precision-Engineered Metrology Products
Contamination Wafer Standards
Engineered to the highest specifications, our silica wafer calibration standards are deposited with NIST Traceable particle size standards on ultra-clean silica wafers, which are essential for maintaining size and calibration accuracy of unpatterned Wafer Inspection Systems and pattern defect Surface Scanning Inspection Systems around the world.
Polystyrene Latex Beads
Our polystyrene latex beads are micro-sphere particle size standards produced from 20 nanometers to 1000 microns, typically in a 15 mm bottle, with 1% or less concentration in De-Ionized water solution. Dry Beads are also available in 1 g, 5 g and up to 1 kg volume. Our Micro-spheres and dry beads are known worldwide for NIST Traceability, size accuracy and narrow size distribution used in a wide range of contamination control and aerosol science applications.
Silica Micro-Spheres
We offer silica micro-sphere, particle size standards, typically used in the deposition of Contamination Calibration Wafer Standards. Silica particles are also used in drug delivery systems to transport, protect, and release drugs in a controlled manner in human and animal applications. Silica nano-particles are especially beneficial in CMP Slurry applications of surface polish of 150mm, 200mm and 300mm silicon wafers.
Our Commitment to Metrology Engineers
At Applied Metrology USA, our unwavering commitment to innovation, quality, and customer support is the cornerstone of our success. We continuously push the boundaries of technology to develop cutting-edge contamination wafer standards and Cleanroom Foggers to support USP and FDA airflow visualization in smoke studies, as well as particle size calibration of Metrology instruments.
Our Polystyrene and Silica Particle Size Standards provide the size accuracy demanded by aerosol and metrology research engineers. We provide our customers with highly accurate wafer standards, size standards and smoke study tools to achieve optimal contamination control goals. Customer satisfaction is at the heart of everything we do, and we strive to exceed expectations by offering tailored solutions and exceptional support.
Chemical Mechanical Polish, CMP Slurry Solutions
Ultra-high purity (UHP) silica slurries for chemical mechanical (CMP) polishing with a very narrow particle size distribution at 300 nm, 500 nm and 800 nm peak sizes in 5 gallon volumes with up to 40 wt% solids. Our spherical, high purity silica enables a controlled removal rate off the silicon wafer surface to produce a very flat wafer surface. Particles are ion-stabilized for an aggregate-free solution. CMP slurries available at 300nm, 500 nm and 800 nm in 5 gallon volumes at up to 40 wt% solids.
Uncompromising Quality
Quality is the hallmark of our brand. Each product undergoes rigorous testing and quality control processes to ensure it meets the stringent requirements of our customers.
Customer Support Satisfaction
We believe that our success is measured by the satisfaction of our customers. Our dedicated support team works tirelessly to provide personalized service and solutions that address the unique needs of each client.
“Applied Metrology USA’s products have significantly improved our contamination control processes. Their commitment to quality and innovation is evident in every product we use.”
John Smith
Senior Process Engineer
“The precision and reliability of Applied Metrology USA’s wafer standards are unmatched. Their customer service team is always responsive and helpful, making them a trusted partner in our operations.”
Emily Johnson
Clean Room Manager
“We have been using Applied Metrology USA’s polystyrene latex beads for our research, and the results have been outstanding. Their products are of the highest quality, and their support team is exceptional.”
Sarah Williams
Quality Assurance Manager
“Applied Metrology USA has consistently provided us with top-notch products that meet our stringent requirements. Their dedication to customer satisfaction is commendable.”
Michael Lee
Research Scientist
Explore Our Product Range
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Discover Our Precision-Engineered Solutions
Call us to specify the Calibration Wafer Standard you need to calibrate your wafer inspection tools. We produce 300 mm, 200 mm, 150 mm, 100 mm wafer calibration standards and silica contamination wafer standards on ultra-clean silicon wafers for many Semiconductor Metrology Managers around the world. We can produce Wafer Standards using polystyrene or silica microspheres, as imaged at right. Our particle size standards and beads are used in Aerosol Science, Metrology and CMP Slurry applications around the world. Contact us today at 303-999-6837 to discuss your requirements for Wafer Calibration Standards, Cleanroom Foggers and NIST Traceable, Particle Size Standards.
