John Doe is the Chief Metrology Officer at Applied Metrology USA. With over 20 years of experience in the semiconductor industry, John has been instrumental in developing advanced contamination control solutions. His expertise in precision engineering and commitment to innovation have made him a respected leader in the field. John holds a Ph.D. in Materials Science and has authored numerous publications on metrology and contamination control. At Applied Metrology USA, he leads a team of dedicated professionals who are passionate about delivering high-quality products and exceptional customer service.